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MOCVD Scrubber

MOCVD (Metal Organic Chemical Vapor Deposition) is a technology used in semiconductor industry, including LEDS, Lasers, Solar cells and field effect transistors. This technology is used to deposit very thin layers of atoms onto a semiconductor wafer. It is the most important manufacturing MOCVD process for III – V semiconductors, especially based on Gallium Nitride (GaN).

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MOCVD Scrubber

MOCVD (Metal Organic Chemical Vapor Deposition) is a technology used in semiconductor industry, including LEDS, Lasers, Solar cells and field effect transistors. This technology is used to deposit very thin layers of atoms onto a semiconductor wafer. It is the most important manufacturing MOCVD process for III – V semiconductors, especially based on Gallium Nitride (GaN).

Apzem approach is to eliminate fumes from CVD process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills.

  • Performance Guaranteed
  • Low maintenance
  • Low pressure drop, Minimal energy cost
  • No water, ETP is not required
  • No hazardous by-product
  • Chemical Reactor vents
  • Laboratory
  • Hospital
  • Food processing area
  • Storage tank vent
  • Air flow rate from 50 CFM to 2000 CFM
  • Concentration:  1 ppm to 200 ppm (continuous) up to 2000 ppm (Intermittent)
  • Removal efficiency: up to 99.99 %
  • Material of Construction: MS with Epoxy lining
  • Construction: Heavy Gauge, Fully welded cabinet, robust construction

 

Dimensions

Model Air flow rate (CFM) Dimension

Diameter (mm)

Height (mm)
ADS-30 100 300 1400
ADS-45 300 450 1500
ADS-60 500 600 1500
ADS-75 800 750 1650
ADS-90 1000 900 1700
ADS-105 1500 1050 2000
ADS-120 2000 1200 2200

 

lower: Direct drive, High efficiency, Low noise

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