Hydrogen Fluoride HF Monitoring services: 

Hydrogen fluoride (HF) can be found in gaseous form or liquid state at ambient temperature. It is  combination of Hydrogen Atom & Fluorine Atom.

Apzem’s Air Quality monitoring

Apzem’s Air Quality monitoring is done by industrial experts with years of rich expertise in the domain of air quality monitoring & dust, fume control.

Inhalation & Ingestion Health Hazards

Hydrogen Cyanide HCN Monitoring 

Hydrogen Cyanide is a colorless gas ( At higher temperatures ). Hydrocyanic acid is a colorless or pale blue liquid, with bitter almond odor and bitter burning taste. Hydrogen cyanide is highly volatile and produces lethal concentrations at room temperature and the HCN vapor is flammable and potentially explosive. Its used as 96% aqueous solution and is soluble in water.

Hydrogen cyanide is a predominant industrial chemical and primarily used in the manufacturing of plastics, synthetic fibers like nylon, paints and other chemicals, ore-extraction, electroplating, dying, printing, photography, metal cleaning etc. HCN and other cyanide compounds are also being used as a fumigant to control pests.

Common Sources of hydrogen cyanide

Hydrogen cyanide is released from a several natural processes such as, by bacteria, fungi, volcanic activity etc. Other sources includes industrial processes, from combustion or from accidents involving HCN transport. Combustion processes produce hydrogen cyanide gas in the form of gas. Other sources of HCN emission includes building fires, cigarettes, vehicles exhausts and fires involving nitrogen-containing materials such as polyurethane foams.

Hydrogen Cyanide HCN Monitoring services: 

Apzem’s Air Quality monitoring is done by industrial experts with years of rich expertise in the domain of air quality monitoring & dust, fume control. HCN Gas Level monitoring is primarily done to detect and measure parts per billion levels of HCN

H2S Monitoring services: 

Apzem’s Air Quality monitoring is done by industrial experts with years of rich expertise in the domain of air quality monitoring & dust, fume control. H2S Gas Level monitoring is primarily done to detect and measure parts per billion levels of H2S

H2S Level Monitoring – Hydrogen sulfide gas level monitoring services in Chennai, India | Apzem, Into Air Pollution Control & Monitoring Services for over more than a decade ..

Venturi scrubber manufacturers

A venturi is designed with sudden contraction and expansion to increase the difference in fluid velocity. The differential velocity and turbulence created in the venturi throat creates thorough mixing of scrubbing liquid with pollutants at the throat and causes pollutants diffusion into the liquid.

Ethylene Oxide Scrubber

Ethylene oxide is a colourless, flammable gas. It will be used as sterilizing agent for medical equipment and food products, also in the manufacturing of chemical products and intermediate for organic synthesis.

While handling, ethylene oxide fumes will be generated highly at atmospheric pressure because of its higher vapour pressure. These fumes are carcinogenic in nature.

Ethylene oxide dissolves easily in water and forms ethylene glycol but the neutralization/degradation of ethylene glycol is very slow process. If we use wet scrubber, water will be saturated with ethylene oxide, thus giving low efficiency at recirculation. Alternatively, once through water for wet scrubbing is generally not practical since it consumes large amount of water.

Apzem approach is to eliminate ethylene oxide fumes from your facility using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills.

ipa scrubber

The emission of volatile organic compounds from industrial processes are one of the main sources of air pollution. Isopropyl alcohol (IPA) is the common solvent used in cleaning process. Large amount of IPA vapors are emitted and directly released into the atmosphere. Direct exposure to IPA vapors irritates the respiratory tract, narcotic effect, producing symptoms of dizziness, drowsiness.

NIOSH REL

TWA 400 ppm (980 mg/m³) ST 500 ppm (1225 mg/m³)

OSHA PEL

TWA 400 ppm (980 mg/m³)

IDLH

2000 ppm [10%LEL]

Apzem has designed and developed a treatment systems with method for removing Isopropyl alcohol fumes in the exhaust gas stream containing IPA. The developed system has specialized carbon media to adsorb the IPA vapors and reduces the IPA concentration to below the threshold limit value.

The emission of volatile organic compounds from industrial processes are one of the main sources of air pollution. Isopropyl alcohol (IPA) is the common solvent used in cleaning process. Large amount of IPA vapors are emitted and directly released into the atmosphere. Direct exposure to IPA vapors irritates the respiratory tract, narcotic effect, producing symptoms of dizziness, drowsiness.

NIOSH REL

TWA 400 ppm (980 mg/m³) ST 500 ppm (1225 mg/m³)

OSHA PEL

TWA 400 ppm (980 mg/m³)

IDLH

2000 ppm [10%LEL]

Apzem has designed and developed a treatment systems with method for removing Isopropyl alcohol fumes in the exhaust gas stream containing IPA. The developed system has specialized carbon media to adsorb the IPA vapors and reduces the IPA concentration to below the threshold limit value.

semiconductor scrubber

• The fast growth in electronic industry has brought new environmental challenges for processes applied in manufacturing of semiconductor chips, which are important key part of many advanced electronic devices.
• Potentially hazardous chemicals; arsine, silane and phosphine are mainly used in fabrication of semiconductor by chemical vapor deposition (CVD).
• Many large companies have improved facilities for handling and controlling the materials. However, small scale industries still are venting the by product gases into atmosphere directly. Increasing of production day by day, venting option is no longer is acceptable. There must be a regulation for controlling hazardous vapor containing silane, phosphine and arsine.
• We use state of the art cleaning technology to remove pollutants/contaminants that cause errors in semiconductor devices. It is designed considering to increase product yield, profitability and decrease the cost.
• Apzem developed a scrubber with innovative scrubbing material, which are specific in removing toxic gas emissions from semiconductor industry.
• Apzem semiconductor scrubber is smaller than conventional air pollution control equipment. Instead of installing a large equipment at outside of pant, our products can be placed at individual source. The scrubber convert the hazardous gases into simple non-toxic substances through chemical adsorption. Our products assist in eliminating toxic emissions and minimizing solid wastes from semiconductor fabrication plants.

MOCVD Scrubber

MOCVD (Metal Organic Chemical Vapor Deposition) is a technology used in semiconductor industry, including LEDS, Lasers, Solar cells and field effect transistors. This technology is used to deposit very thin layers of atoms onto a semiconductor wafer. It is the most important manufacturing MOCVD process for III – V semiconductors, especially based on Gallium Nitride (GaN).

Apzem approach is to eliminate fumes from CVD process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills.

ion implant scrubber

A dry scrubber use catalyst to remove toxic components by chemical adsorption on the surface. The adsorption does not depend on pollutant concentration and contact time, adsorption will take place in very short period of time. When the pollutants adsorbed on to the surface, the catalyst will convert the simple chemicals which is non-toxic and can be disposed of easily. The catalyst is to be replaced frequently when it saturated with pollutants. Optional sensor will be provided for indication of catalyst saturation. This scrubber is recommended for gas stream with low concentration of toxic pollutants, because of adsorption capacity of catalyst. In case of emergency applications, it will be good to provide scrubber for gas stream with high concentration. However, the gas stream with high concentrations will not be scrubbed continuously. The acids used are extremely corrosive and the fume generated from the process attack all tissues of the body.

Apzem approach is to eliminate acid fumes from your process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills. The scrubber is available as portable and centralized scrubber system based on conditions and requirements.

cvd scrubber

Chemical Vapor Deposition

Deposition by chemical reaction between reactants. It is a chemical process that deposits thin film of diverse chemical substances. A substrate is exposed to volatile precursors and react to generate required deposit. Simultaneously, the byproducts also generated from the process.  Precursors used to deposit silicon is silane (SiH4).

It is very flexible process mostly used in production of powders, coating and monolithic parts. Using CVD, we can produce any metallic or non-metallic elements. It is mainly applied in semiconductor industries, as part of device fabrication process in semiconductor to deposit various films including silicon, siO2, silicon nitride, titanium nitride, silicon germanium. It is a linear growth process in which, gas deposits a thin film on wafer. It produce very thin silicon dioxide because of thin film deposition rather than thick grown film. Because of its thin film with high electrical resistance, it is mainly used in semiconductor devices, ICs and some other applications. CVD is performed when external layer is required but silicon will not be oxidized.

Apzem approach is to eliminate fumes from CVD process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills.