semiconductor scrubber

• The fast growth in electronic industry has brought new environmental challenges for processes applied in manufacturing of semiconductor chips, which are important key part of many advanced electronic devices.
• Potentially hazardous chemicals; arsine, silane and phosphine are mainly used in fabrication of semiconductor by chemical vapor deposition (CVD).
• Many large companies have improved facilities for handling and controlling the materials. However, small scale industries still are venting the by product gases into atmosphere directly. Increasing of production day by day, venting option is no longer is acceptable. There must be a regulation for controlling hazardous vapor containing silane, phosphine and arsine.
• We use state of the art cleaning technology to remove pollutants/contaminants that cause errors in semiconductor devices. It is designed considering to increase product yield, profitability and decrease the cost.
• Apzem developed a scrubber with innovative scrubbing material, which are specific in removing toxic gas emissions from semiconductor industry.
• Apzem semiconductor scrubber is smaller than conventional air pollution control equipment. Instead of installing a large equipment at outside of pant, our products can be placed at individual source. The scrubber convert the hazardous gases into simple non-toxic substances through chemical adsorption. Our products assist in eliminating toxic emissions and minimizing solid wastes from semiconductor fabrication plants.

MOCVD Scrubber

MOCVD (Metal Organic Chemical Vapor Deposition) is a technology used in semiconductor industry, including LEDS, Lasers, Solar cells and field effect transistors. This technology is used to deposit very thin layers of atoms onto a semiconductor wafer. It is the most important manufacturing MOCVD process for III – V semiconductors, especially based on Gallium Nitride (GaN).

Apzem approach is to eliminate fumes from CVD process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills.

ion implant scrubber

A dry scrubber use catalyst to remove toxic components by chemical adsorption on the surface. The adsorption does not depend on pollutant concentration and contact time, adsorption will take place in very short period of time. When the pollutants adsorbed on to the surface, the catalyst will convert the simple chemicals which is non-toxic and can be disposed of easily. The catalyst is to be replaced frequently when it saturated with pollutants. Optional sensor will be provided for indication of catalyst saturation. This scrubber is recommended for gas stream with low concentration of toxic pollutants, because of adsorption capacity of catalyst. In case of emergency applications, it will be good to provide scrubber for gas stream with high concentration. However, the gas stream with high concentrations will not be scrubbed continuously. The acids used are extremely corrosive and the fume generated from the process attack all tissues of the body.

Apzem approach is to eliminate acid fumes from your process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills. The scrubber is available as portable and centralized scrubber system based on conditions and requirements.

cvd scrubber

Chemical Vapor Deposition

Deposition by chemical reaction between reactants. It is a chemical process that deposits thin film of diverse chemical substances. A substrate is exposed to volatile precursors and react to generate required deposit. Simultaneously, the byproducts also generated from the process.  Precursors used to deposit silicon is silane (SiH4).

It is very flexible process mostly used in production of powders, coating and monolithic parts. Using CVD, we can produce any metallic or non-metallic elements. It is mainly applied in semiconductor industries, as part of device fabrication process in semiconductor to deposit various films including silicon, siO2, silicon nitride, titanium nitride, silicon germanium. It is a linear growth process in which, gas deposits a thin film on wafer. It produce very thin silicon dioxide because of thin film deposition rather than thick grown film. Because of its thin film with high electrical resistance, it is mainly used in semiconductor devices, ICs and some other applications. CVD is performed when external layer is required but silicon will not be oxidized.

Apzem approach is to eliminate fumes from CVD process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills.

Meta Etch Scrubber

Traditionally etching was performed by hand. It was implemented by using sharp tipped tool to etch metal according to desired design pattern. This process is time consumable. Nowadays the most popular metal etching is acid etching as the chemical technology has improved, since chemical milling is much faster than mechanical milling. Metal etching is process of creating design on metal surface using acid or mordant. The most commonly used chemicals are nitric acid, hydrochloric acid, potassium chlorate and Ferric Chloride. These acids will be used in different concentrations.

Metal etching Types

• Acid etching
• Aluminium etching
• Brass etching
• Chemical etching
• Copper etching
• Photo etching

The acids used in metal etching are extremely corrosive and the fume generated from the process attack all tissues of the body.

Apzem approach is to eliminate acid fumes from your process using adsorption technology. Specialized adsorption media will be used to get higher removal capacity rather than normal media. The saturated media can be disposed easily in non-hazardous landfills. The scrubber is available as portable and centralized scrubber system based on conditions and requirements.